CVD Equipment Corporation

NasdaqCM:CVV

Sector

🧪 Materials

Industries

🔬 Chemicals & Advanced Materials

🖨 3D Printing

🧷 Aluminum

💻 Semiconductors

🏗️ Steel

Location

United States

Market Cap

USD 19.41 M

Share Price

USD 2.82

Avg Daily Volume

27,004

Change (1 day)

0.36%

Change (1 year)

-28.06%

Change (YTD)

-35.91%

CVD Equipment Corporation EBITDA Margin for the Trailing 12 Months (TTM) ending March 31, 2025: 1.36%

CVD Equipment Corporation EBITDA Margin is 1.36% for the Trailing 12 Months (TTM) ending March 31, 2025, a -105.74% change year over year. EBITDA Ratio is the proportion of Earnings Before Interest, Taxes, Depreciation, and Amortization to total revenue, assessing a company's operational profitability before non-operating expenses and non-cash charges.

CVD Equipment Corporation EBITDA Margin for the Trailing 12 Months (TTM) ending March 31, 2024 was -23.73%, a -562.97% change year over year.
CVD Equipment Corporation EBITDA Margin for the Trailing 12 Months (TTM) ending March 31, 2023 was 5.12%, a -126.45% change year over year.
CVD Equipment Corporation EBITDA Margin for the Trailing 12 Months (TTM) ending March 31, 2022 was -19.37%, a -63.12% change year over year.
CVD Equipment Corporation EBITDA Margin for the Trailing 12 Months (TTM) ending March 31, 2021 was -52.52%, a 1,544.09% change year over year.

Quarterly
Annual
TTM

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Key data

Date	EBITDA Margin	Net Income Margin	EBT Margin	Operating Income Margin

NasdaqCM: CVV

CVD Equipment Corporation

CEO	Mr. Emmanuel N. Lakios
IPO Date	March 1, 1999
Location	United States
Headquarters	355 South Technology Drive
Employees	118
Sector	🧪 Materials
Industries Chemicals & Advanced Materials 🖨 3D Printing 🧷 Aluminum 💻 Semiconductors 🏗️ Steel

Description

CVD Equipment Corporation, together with its subsidiaries, designs, develops, manufactures, and sells process equipment and solutions that are used to develop and manufacture materials and coatings for research and industrial applications in the United States. It operates through three segments: CVD, SDC, and CVD Materials. The company offers chemical vapor deposition systems for use in the research, development, and manufacture of aerospace, medical components, semiconductors, LEDs, carbon nanotubes, nanowires, solar cells, and other industrial applications; and rapid thermal processing systems for use in implant activation, oxidation, silicide formation, and other processes. It also provides annealing, diffusion, and low pressure chemical vapor deposition furnaces for use in diffusion, oxidation, implant anneal, solder reflow, solar cell manufacturing, and other processes; and gas and liquid control systems, such as gas cylinder storage cabinets, custom gas and chemical delivery systems, gas and liquid valve manifold boxes, and gas isolation boxes for semiconductor fabrication processes, solar cells, LEDs, carbon nanotubes, nanowires, and industrial applications. In addition, the company offers standard and custom fabricated quartz-ware used in its equipment and other customer tools, as well as repair and replacement services for existing quartz-ware. Further, it provides MesoPlasma direct write printing, a materials deposition process that provides instrumentation, fine feature patterns, and coatings onto conformal components; and Tantaline corrosion resistant coating for valves, fittings, fasteners, vessels, bellows, and custom designed items, as well as offers carbon composites and electronic materials. The company sells its products primarily to aerospace/defense, medical, electronic component manufacturers, universities, and government and industrial laboratories. The company was incorporated in 1982 and is headquartered in Central Islip, New York.

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